Temperature threshold and water role in CVD growth of single-walled carbon nanotubes

Geng, Junfeng ORCID: 0000-0001-6246-0342, Motta, Marcelo, Engels, Volker, Luo, J. ORCID: 0000-0003-0310-2443 and Johnson, B.F.G. (2016) Temperature threshold and water role in CVD growth of single-walled carbon nanotubes. Frontiers in Materials, 3 (4). ISSN 2296-8016

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Official URL: https://www.frontiersin.org/articles/179246

Abstract

An in-depth understanding of the growth process of single-walled carbon nanotubes is of vital importance to the control of the yield of the material and its carbon structure. Using a nickel/silica (Ni/SiOx) catalyst, we have conducted a series of growth experiments with a chemical vapor deposition (CVD) system. We find that there is a temperature threshold in the CVD process, and if the reaction temperature sets above this threshold, there will be no growth of the nanotubes. Moreover, we find that in association with this temperature effect, water plays an important role in the promotion or termination of the growth of single-walled carbon nanotubes.

Item Type: Article
Uncontrolled Keywords: single-walled carbon nanotubes, nickel catalyst, chemical vapor deposition, nanotube growth, temperature effect, water role
Subjects: T Technology > T Technology (General)
Divisions: ?? iom ??
Depositing User: Mary Barden
Date Deposited: 19 Apr 2018 10:16
Last Modified: 19 Apr 2018 10:16
Identification Number: 10.3389/fmats.2016.00004
URI: http://ubir.bolton.ac.uk/id/eprint/1743

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