Thickness dependent electronic structure of ultra-thin tetrahedral amorphous carbon (ta-C) films

Soin, Navneet ORCID: 0000-0002-0196-2071, Roy, Susanta Sinha, Ray, Sekhar Chandra, Lemoine, Patrick, Rahman, Md Anisur, Maguire, Paul D, Mitra, Sushanta K and McLaughlin, James A (2012) Thickness dependent electronic structure of ultra-thin tetrahedral amorphous carbon (ta-C) films. Thin Solid Films, 520 (7). pp. 2909-2915. ISSN 0040-6090

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Microstructural properties of ultrathin (1-10 nm) tetrahedral amorphous carbon (ta-C) films are investigated by Near Edge X-ray Absorption Fine Structure (NEXAFS) spectroscopy, X-ray Photoelectron Spectroscopy, Raman spectroscopy and Atomic Force Microscopy (AFM). The CK-edge NEXAFS spectra of 1 nm ta-C films provided evidence of surface defects (C - H bonds) which rapidly diminish with increasing film thickness. A critical thickness for stabilization of largely sp 3 matrix structure distorted by sp 2 sites is observed via the change of ?*C*C peak behavior. Meanwhile, an increase in the film thickness promotes an enhancement in sp 3 content, the film roughness remains nearly constant as probed by spectroscopic techniques and AFM, respectively. The effect of thickness on local bonding states of ultrathin ta-C films proves to be the limiting factor for their potential use in magnetic and optical storage devices.

Item Type: Article
Uncontrolled Keywords: Near edge X-ray absorption fine structure spectroscopy, Filtered cathodic vacuum arc, Thin films, Tetrahedral amorphous carbon, X-ray photoelectron spectroscopy, Raman spectroscopy
Subjects: Q Science > QC Physics
Divisions: University of Bolton Research Centres > Institute for Materials Research and Innovation
Depositing User: Dr Navneet Soin
Date Deposited: 28 Mar 2018 13:16
Last Modified: 28 Mar 2018 13:16
Identification Number: 10.1016/j.tsf.2011.12.039

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