Enhanced and stable field emission from in situ nitrogen-doped few-layered graphene nanoflakes

Soin, Navneet ORCID: 0000-0002-0196-2071, Sinha Roy, Susanta, Roy, Soumyendu, Hazra, Kiran Shankar, Misra, Devi S, Lim, Teck H, Hetherington, Crispin J and McLaughlin, James A (2011) Enhanced and stable field emission from in situ nitrogen-doped few-layered graphene nanoflakes. The Journal of Physical Chemistry C, 115 (13). pp. 5366-5372. ISSN 1932-7447

Full text not available from this repository.
Official URL: https://pubs.acs.org/page/jpccck/about.html

Abstract

Vertically aligned few-layered graphene (FLG) nanoflakes were synthesized on bare silicon (Si) substrates by a microwave plasma enhanced chemical vapor deposition method. In situ nitrogen (N2) plasma treatment was carried out using electron cyclotron resonance plasma, resulting in various nitrogen functionalities being grafted to the FLG surface. Compared with pristine FLGs, the N2 plasma-treated FLGs showed significant improvement in field emission characteristics by lowering the turn-on field (defined at 10 μA/cm2) from 1.94 to 1.0 V/μm. Accordingly, the field emission current increased from 17 μA/cm2 at 2.16 V/μm for pristine FLGs to about 103 μA/cm2 at 1.45 V/μm for N-doped FLGs. Furthermore, N-doped FLG samples retained 94% of the starting current over a period of 10 000 s, during which the fluctuations were of the order of ±10.7% only. The field emission behavior of pristine and N2 plasma-treated FLGs is explained in terms of change in the effective microstructure as well as a reduction in the work function as probed by X-ray photoelectron valence band spectroscopy.

Item Type: Article
Additional Information: This document is the Author’s version of a Submitted Work that was subsequently accepted for publication in Journal of Physical Chemistry C, copyright © American Chemical Society after peer review. To access the final edited and published work see https://pubs.acs.org/doi/abs/10.1021/jp110476m
Subjects: Q Science > QC Physics
Divisions: University of Bolton Research Centres > Institute for Materials Research and Innovation
Depositing User: Dr Navneet Soin
Date Deposited: 28 Mar 2018 14:53
Last Modified: 28 Mar 2018 14:53
Identification Number: 10.1021/jp110476m
URI: http://ubir.bolton.ac.uk/id/eprint/1480

Actions (login required)

Edit Item Edit Item